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Example
  • Deposition and sputtering

Deposition and sputtering

Computational conditions

  • Comparison of profiles with the case of without sputtering and the case of with sputtering of which yields was assumed as Yield=A*(E_in^0.5 - E_th^0.5)*f(angle)

Results

  • Cpu timeFIntel Xeon 3.8GHz, 400[s](without sputtering), 1000[s](with sputtering)
T=300(without sputtering) Dependency of incident angle:f(angle) T=300(with sputtering)


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