PIC-MCCM(Particle-In-Cell with Monte Carlo Collision Module) computes spatial distribution of density, energy of charged particles and electric field etc., in a reactor by particle model.

Description of method

PIC-MCCM is a module to compute plasma parameters of non-equilibrium and low temperature plasma in various semiconductor manufacturing reactors, magnetron sputtering reactors and thin-film manufacturing reactors. A numerical method of behavior of charged particles is PIC(Particle-In-Cell) method and a numerical method of collision between charged particles and neutral particles (elastic, inelastic such as ionization, excitation, charge exchange and dissociation etc.) is Monte Carlo method, respectively. PIC-MCCM is a module to compute the motion of charged particles by small time steps(<=ns) in the electric field generated by spatial charge and electrodes(RF,DC and grounded),insulators and/or ICP coils under magneto-statistical field in two-dimensional Cartesian or cylindrical (axial symmetry model) coordinates.

Input data

• Specify computational domain, RF and DC electrodes, insulators and/or ICP coils defined by two-dimensional rectangular mesh system in Cartesian or cylindrical (axial symmetry model) coordinates.
• Specify species of fed or background gas
• Select the reaction (elastic, ionization, excitation, dissociation and recombination etc.)between particles defined by internal database through PEGASUS/GUIM
• Specify file name containing magnetic flux density

Output data

• Spatial distributions of density, energy and flow velocity for each charged particles.
• Spatial distributions of source rates of charged particles, radical and excited neutral particles.
• Particle and energy fluxes of each charged particles on the targets and walls.
• Spatial distributions of electric potential and electric field.
• Energy distribution function of charged particles.

Example

• Plasma parameters in a DC magnetron sputtering reactor
• Plasma parameters in GEC reactor