Sputtering simulation Module

SPUTSM

SPUTSM is a module to compute sputtered particle flux, angular distribution and energy distribution of sputtered particles by using SASAMAL and the result such as incident ion flux, ion energy and incident angle of ions from PIC-MCCM.

Description

Computational method of SPUTSM is same as SASAMAL since SPUTSM consists of SASAMAL for an engine. Practical analysis of the motion of sputtered particle should be done by the following manner combining with three or four modules in PEGASUS. In advance, if magnetron sputtering reactor would be used, MSSM would be used to compute magneto-static field.

  1. Plasma simulation by PIC-MCCM
    • At first, PIC-MCCM should be used to compute ion flux, ion energy and incident angle of ions to the target.
  2. Simulation to get the information concerning the sputtered particles by SPUTSM
    • Second, SPUTSM should be used to compute sputtered particle flux, sputtered angular distribution and sputtered energy of sputtered neutral particles.
  3. Rarefied gas simulation by DSMCM
    • At last, DSMCM should be used to compute the motion of sputtered particles in the reactor, neutral particle flux onto the substrate and thickness distribution by particle deposition on the substrate.

So, SPUTSM is an interface module to compute whole of sputtering simulation through above three steps of which core module is SASAMAL.

Input data

  • Specify information of incident ions to the target as the result from PIC-MCCM
  • Specify information of the target materials

Output data

  • Sputtered particle flux, angle and energy distribution of sputtered particles.

Example