Comparison experiment and simulation for film thickness in vacuum evaporation equipment

Computational conditions

1. Evaporation atom : Au
2. Background Ar gas pressure : 1.8E-3, 0.05, 0.1, 0.415, 0.867 [Pa]

Result

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  Ar gas pressure dependency, comparison with experiment.

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  Distribution of incident speed

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  Density,Temperature,Pressure and velocity spatial distribution and adsorbed flux on the substrate