Magnetic field analysis in a magnetron sputtering device
Computational conditions
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- Residual magnetic flux density Br 1.0T
- Coercive force bHc 8500 Oe
Result
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Lines of magnetic force
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Magnetic flux density
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Horizontal componet of magnetic flux density
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Horizontal componet of magnetic flux density on target
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Vertical componet of magnetic flux density
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Vertical componet of magnetic flux density on target