Cl2 ICP/Etching reactor

Computational conditions

Reference: M. Shiozawa and K. Nanbu,"Coupling of plasma and flow in materials processing", Thin Solid Films, Vol.457,pp.48-54,2004

Result

  • Electron density

    Electron density

  • Electron temperature

    Electron temperature

  • Electric potential

    Electric potential

  • EEDF (electron energy distribution function)

    EEDF (electron energy distribution function)

  • Power deposition

    Power deposition

  • Azimuthal electric field

    Azimuthal electric field

  • Cl2(+) density

    Cl2(+) density

  • Cl(+) density

    Cl(+) density

  • Cl(-) density

    Cl(-) density

  • Cl2 density

    Cl2 density

  • Cl density

    Cl density