Deposition and sputtering

Computational conditions

  • Comparison of profiles with the case of without sputtering and the case of with sputtering of which yields was assumed as Yield=A*(E_in^0.5 - E_th^0.5)*f(angle)

Result

  • T=300[s] (without sputtering)

    T=300[s] (without sputtering)

  • Dependency of incident angle :f(angle)

    Dependency of incident angle :f(angle)

  • T=300[s] (with sputtering)

    T=300[s] (with sputtering)

CPU timeļ¼šIntel Xeon 3.8GHz, about 400[s](without sputtering), about 1000[s](with sputtering)