Sputtering particle transfer in a DC magnetron sputtering equipment

Computational conditions

Background gas Ar is uniformly distribution at 1mTorr, no flow field of Ar is assumed.
Target material is Al. In this case, the sputtered particle flux and energy from the target are assumed as 1.0e18 [/m2/s] and 1 eV,respectively. But the sputtered particle flux, the angular distribution and energy of sputtered partciles are computed by PEGASUS/SPUTSM after plasma simulation by PEGASUS/PIC-MCC.